PISCATAWAY, NJ--(Marketwired - Apr 30, 2014) - The Interconnect Modeling Technical Advisory Board (IMTAB), an IEEE-ISTO Federation Member Program, today announced the incorporation of new ...
Long-term reliability has become a significant challenge for design of integrated circuit (IC) chips used in today's computers and smart phones. Among many effects, electromigration-induced ...
Electromigration (EM) refers to the undesired migration of metal atoms along a metal interconnect. This migration occurs due to the “electron wind” (which is the momentum transfer created by electrons ...
Electro-Migration (EM) is a critical problem for interconnect reliability of modern Integrated Circuits (ICs), especially as the feature size becomes smaller. In Three-Dimensional (3D) IC technology, ...